Wireless Infrastructure
Meeting the continually evolving demands for 4G LTE & 5G wireless infrastructure applications with RFHIC's gallium nitride (GaN) on silicon carbide (SiC) technology solutions
RFHIC’s IE18220PG is a discrete gallium nitride on silicon carbide (GaN-on-SiC) high-electron-mobility transistor (HEMT) which operates from 1805 to 1880 MHz. The IE18220PG delivers 220 W of saturated power at 48V with a drain efficiency of 41% at Psat. The device is a single-stage internally matched power amplifier transistor packaged in our NS-AS01 ceramic package. The IE18220PG can be used in Doherty architecture for the final stage of a base station power amplifier for WiMAX, LTE, and GSM systems.
View Product Specification| Min Freq.(MHz) | 1805MHz |
|---|---|
| Max Freq.(MHz) | 1880MHz |
| Typ Output Power(W) | 50W |
| Saturation Power(W) | 220W |
| Power Gain(dB) | 18.1dB |
| Efficiency | 41% |
| VDC(V) | 48 |
| Package | NS-AS01 |
| Package Type | Flange |